为了深入了解大气压下氩气微波等离子射流内部电子的状态,利用发射光谱法对大气压下氩气微波等离子体进行了诊断.以玻尔兹曼斜率法对等离子体中电子激发温度进行测算,以斯塔克展宽计算电子密度.研究了等离子体射流方向上不同区域电子激发温度和电子密度的分布规律及微波功率对电子激发温度和电子密度的影响.结果表明,在本实验条件下等离子体射流电子激发温度为4 000～6 000 K,电子数量密度为(2.4～2.8)×1018 cm-3,电子激发温度和电子密度的最大值均出现在距波导管底边20 mm处,并以此处为中心,分别向上下2个方向呈现不完全对称的递减分布,微波功率增加影响等离子体电子密度和电子温度的交替上升.
[1] 杨涓, 许映乔, 朱良明, Yang Juan, Xu Ying-Qiao, Zhu Liang-Ming. 局域环境中微波等离子体电子密度诊断实验研究 [J]. 物理学报 2008.doi:10.3321/j.issn:1000-3290.2008.03.080
[2] 屠昕, 陆胜勇, 严建华, 马增益, 潘新潮, 岑可法, CHERON Bruno, TU Xin, LU Sheng-yong, YAN Jian-hua, MA Zeng-yi, PAN Xin-chao, CEN Ke-fa, CHERON Bruno. 大气压直流氩等离子体光谱诊断研究 [J]. 光谱学与光谱分析 2006.doi:10.3321/j.issn:1000-0593.2006.10.003
[3] 唐平瀛, 刘铁, 丁伯南, 戴晶怡. 高频离子源等离子体的光谱诊断 [J]. 强激光与粒子束 2003.
[4] S.J. Askari, G.C. Chen, F. Akhtar. Adherent and low friction nano-crystalline diamond film grown on titanium using microwave CVD plasma [J]. Diamond and Related Materials 2008, 3(3).
[5] Dong H. Shin, Chan U. Bang, Jong H. Kim, Kun H. Han, Yong C. Hong, Han S. Uhm, Dae K. Park, Ki H. Kim. Modification of metal surfaces by microwave plasma at atmospheric pressure [J]. Surface & Coatings Technology 2007, 9/11(9/11).
[6] KRAWCZYK K, DROZDOWSKI M, NAPERTY K. Nitrous oxide processing by a combination of gliding and microwave discharges [J]. Catalysis Today 2007, 119(1-4).
[7] Jing Xue, Li Chen, Honglin Wang. Degradation mechanism of Alizarin Red in hybrid gas-liquid phase dielectric barrier discharge plasmas:Experimental and theoretical examination [J]. Chemical engineering journal 2008, 1/3(1/3).
[8] Itagaki N, Sasaki K, Kawai Y. Electron temperature measurement in SiH4/H-2 ECR plasma produced by 915 MHz microwaves [J]. Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films 2006, 0(0).
[9] Schinkoth D., Schulz-Gulde E., Kock M.. Experimental stark broadening parameters for near-infrared ArI and KrI lines [J]. Journal of Quantitative Spectroscopy & Radiative Transfer 2000, 6(6).
[10] J.Torres, M.J.van de Sande, J.J.A.M.van der Mullen, A.Gamero, A.Sola. Stark broadening for simultaneous diagnostics of the electron density and temperature in atmospheric microwave discharges [J]. Spectrochimica Acta, Part B. Atomic Spectroscopy 2006, 1(1).
[11] Pawel Pohl, Israel Jimenez Zapata, Martin A.Amberger. Characterization of a microwave microstrip helium plasma with gas-phase sample introduction for the optical emission spectrometric determination of bromine, chlorine, sulfur and carbon using a miniaturized optical fiber spectrometer [J]. Spectrochimica Acta, Part B. Atomic Spectroscopy 2008, 3(3).
[12] Jamroz P, Zyrnicki W. A spectroscopic study into the decomposition process of titanium isopropoxide in the nitrogen-hydrogen 100 kHz low-pressure plasma [J]. Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology 2008, 6(6).
[13] GRIEM HANS R. Plasma spectroscopy [M]. New York:McGraw-Hill 1964.
[14] CADWELL L, HWEL L. Time-resolved emission spectroscopy in laser-generated argon plasmas-determination of Stark broadening parameters [J]. Journal of Quantitative Spectroscopy and Radiative Transfer 2004, 83(3-4).
[15] V.Milosavljevic, A.R.Ellingboe, S.Djenize. Measured Stark widths and shifts of the neutral argon spectral lines in 4s-4p and 4s-4p'transitions [J]. Spectrochimica Acta, Part B. Atomic Spectroscopy 2006, 1(1).
[16] Jankowski K.. Some spatial effects observed in the axially viewed filament argon microwave induced plasma with solution nebulization [J]. Spectrochimica Acta, Part B. Atomic Spectroscopy 2002, 5(5).
[17] PIOTROWSKI A. Non-LTE argon plasma composition at atmospheric pressure [J]. Czechoslovak Journal of Physics 2003, 53(04).
