采用Monte Carlo方法，模拟了EACVD淀积金刚石薄膜中氢分解过程 .建立了电子碰撞使氢分解的模型，给出了在基片表面电子及氢原子的能量分布.结果对EACVD淀积金刚石 薄膜的研究有重要意义.
Hydrogen dissociation in the process of electron assisted chemicalvap or deposition（EACVD）of diamond thin films is simulated by using Monte Carlomethod. The model of hydrogen dissociation through electron impacting is suggested . The energy distribution of electrons and H atoms on the surface of the substra te are obtained. The results are of great importance to the study of diamond thi n films deposited by EACVD.
[1] YARBROUGHW A, MESSIER R. Current issues and problems in the chemical vapor deposition of diamond [J]. Science 1990, 247.
[2] Yarbrough W A, TANKARA K, MERCRAY M. Hydrogen assisted heat transfer during diamond growth using carbon and tantalum filaments [J]. Applied Physics Letters 1992, 60.
[3] Frank M, SPEAR K E. Growth mechanism of vapor-deposition diamond [J]. Journal of Materials Research 1988.
[4] 韩理, 王晓辉, 于威, 董丽芳, 李晓苇, 傅广生. 电子助进热丝化学汽相沉积金刚石薄膜 [J]. 1997.
[5] SAELEE H T, LUCAS J. Simulation of electron swarm motion in hyd rogen and carbon monoxide for high E/N [J]. Journal of Physics D:Applied Physics 1977, 10.
