Journal of Hebei University(Natural Science Edition) >

2009 , Vol. 29 >Issue 2: 150 - 152

DOI: https://doi.org/10.3969/j.issn.1000-1565.2009.02.011

Influence of Nitridation Temperature on the Microstructure of ZnO Films

  • ZHANG Li ,
  • YU Wei ,
  • XU He-ju ,
  • ZHANG Jin-chuan ,
  • FU Guang-sheng
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Online published: 2009-03-25

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ZHANG Li , YU Wei , XU He-ju , ZHANG Jin-chuan , FU Guang-sheng . Influence of Nitridation Temperature on the Microstructure of ZnO Films[J]. Journal of Hebei University(Natural Science Edition), 2009 , 29(2) : 150 -152 . DOI: 10.3969/j.issn.1000-1565.2009.02.011

References

[1] Uchida K., Yano F., Kouguchi M., Tanaka T., Minagawa S., Watanabe A.. NITRIDATION PROCESS OF SAPPHIRE SUBSTRATE SURFACE AND ITS EFFECT ON THE GROWTH OF GAN [J]. Journal of Applied Physics 1996, 7(7).
[2] Comprehensive study of ZnO films prepared by filtered cathodic vacuum arc at room temperature [J]. Journal of Applied Physics 2003, 3(3).
[3] Mei ZX, Du XL, Wang Y, Ying MJ, Zeng ZQ, Zheng H, Jia JF, Xue QK, Zhang Z. Controlled growth of Zn-polar ZnO epitaxial film by nitridation of sapphire substrate [J]. Applied physics letters 2005, 11(11).
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