Journal of Hebei University(Natural Science Edition) >

2001 , Vol. 21 >Issue 1: 34 - 37

DOI: https://doi.org/10.3969/j.issn.1000-1565.2001.01.008

Energy Distribution of Electrons and H Atoms on the Surface of the Substrate during Electron Assisted Chemical Vapor Deposition of Diamond

  • DONG Li-fang ,
  • ZHANG Yu-hong ,
  • CHEN Jun-ying
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Online published: 2001-02-25

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Abstract

Hydrogen dissociation in the process of electron assisted chemicalvap or deposition（EACVD）of diamond thin films is simulated by using Monte Carlomethod. The model of hydrogen dissociation through electron impacting is suggested . The energy distribution of electrons and H atoms on the surface of the substra te are obtained. The results are of great importance to the study of diamond thi n films deposited by EACVD.

Cite this article

DONG Li-fang , ZHANG Yu-hong , CHEN Jun-ying . Energy Distribution of Electrons and H Atoms on the Surface of the Substrate during Electron Assisted Chemical Vapor Deposition of Diamond[J]. Journal of Hebei University(Natural Science Edition), 2001 , 21(1) : 34 -37 . DOI: 10.3969/j.issn.1000-1565.2001.01.008

References

[1] YARBROUGHW A, MESSIER R. Current issues and problems in the chemical vapor deposition of diamond [J]. Science 1990, 247.
[2] Yarbrough W A, TANKARA K, MERCRAY M. Hydrogen assisted heat transfer during diamond growth using carbon and tantalum filaments [J]. Applied Physics Letters 1992, 60.
[3] Frank M, SPEAR K E. Growth mechanism of vapor-deposition diamond [J]. Journal of Materials Research 1988.
[4] 韩理, 王晓辉, 于威, 董丽芳, 李晓苇, 傅广生. 电子助进热丝化学汽相沉积金刚石薄膜 [J]. 1997.
[5] SAELEE H T, LUCAS J. Simulation of electron swarm motion in hyd rogen and carbon monoxide for high E/N [J]. Journal of Physics D:Applied Physics 1977, 10.
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