Carrier concentration distribution in S-doped LEC-GaP single crystal

  • LIN Quan ,
  • MA Yingjun ,
  • YU Hongguo ,
  • XU Xing ,
  • MA Yuanfei ,
  • ZHU Xianchao
Expand
  • GRINM Electro-Optic Materials Co., Ltd., General Research Institude for Nonferrous Metals, Beijing 100088, China

Received date: 2018-12-12

  Online published: 2019-07-25

Abstract

Two inches N-type sulfer-doped GaP single crystal was grown by high pressure LEC method,crystals diameter were controlled by floating coracle technique.The doping amount was calculated according to the theoretical formula, and the carrier concentration of the head, middle and tail of the sulfur-doped GaP single crystal were measured by the Vanderbilt method.The influence of the shape of the solid-liquid interface on the carrier distribution is analyzed.The flat solid-liquid interface has a more uniform carrier distribution in the crystal.The distribution of lateral and longitudinal carriers and their influencing factors on the coracle-controlled single crystal were analyzed.The longitudinal carrier distribution of the single crystal controlled by computer and the floating coracle is compared and discussed.It shows that the floating coracle control and process cause the change of the segregation coefficient and the compensation degree during the crystal growth, so that the longitudinal carrier concentration of the crystal first decreases and then rises.It is proposed that the single crystal longitudinal carrier uniformity can be improved by shifting crystal pulling.The influence of the weight of the coracle on the carrier distribution is discussed.The longitudinal carrier distribution is more uniform while using heavier coracle during GaP crystal growth.

Cite this article

LIN Quan , MA Yingjun , YU Hongguo , XU Xing , MA Yuanfei , ZHU Xianchao . Carrier concentration distribution in S-doped LEC-GaP single crystal[J]. Journal of Hebei University(Natural Science Edition), 2019 , 39(4) : 347 -352 . DOI: 10.3969/j.issn.1000-1565.2019.04.003

References

[1] 崔连森.GaP发光二极管中深能级对发光强度的影响研究[J].光学技术, 2009, 35(6): 832-834.DOI:10.3321/j.issn:1002-1582.2009.06.029.
[2] 郑元宇.GaAs基AlGaInP发光二级管亮度提升研究[J].中国高新技术企业, 2017(1): 27-28.DOI:10.13535/j.cnki.11-4406/n.2017.01.013.
[3] 卢建娅, 谭明, 杨文献, 等.基于金属背支撑刻蚀技术的柔性AlGaInP/AlGaAs/GaAs三结太阳电池研制[J].半导体光电, 2016, 37(5): 688-693.DOI:10.16818/j.issn1001-5868.2016.05.019.
[4] BRUDNYI V, PRUDAEV I, OLEINIK V, et al.Electron irradiation degradation of AlGaInP/GaAs light-emitting diodes[J].Physica Status Solidi(a), 2018, 215(8): 1700445.DOI:10.1002/pssa.201700445.
[5] 林泉, 徐小林, 金攀.φ60mm掺碲GaP单晶的研制[J].半导体技术, 2006, 31(11): 847-850.DOI:10.3969/j.issn.1003-353X.2006.11.013.
[6] 巨国贤.LEC法生长GaP单晶[D].长春:长春光学精密机械学院,2001.
[7] А.Я.Нашельский, Монокристаллы Полупроводников. Si, Ge, GaAs, GaP[J].Москва, Металлургия, 1978,136.
[8] 劳迪斯(R.A.Laudise).单晶生长[M].刘光照,译.北京: 科学出版社, 1979.
[9] 杨翠.直拉单晶硅生长过程中固液界面形状研究[J].内蒙古石油化工, 2017, 43(10): 10-14.DOI:10.3969/j.issn.1006-7981.2017.10.005.
[10] FUKUDA T, WASHIZUKA S, KOKUBUN Y, et al.Growth of large diameter GaP single crystal by a computer controlled LEC technique[J].Int Symp, GaAs and Related Compounds, 1981, 63: 45-46.
[11] AZUMA Y, USAMI N, UJIHARA T, et al.Growth of SiGe bulk crystal with uniform composition by directly controlling the growth temperature at the crystal-melt interface using in situ monitoring system[J].Journal of Crystal Growth, 2001, 224(3/4): 204-211.DOI:10.1016/s0022-0248(01)00974-5.
Outlines

/

〈 〉