Energy Density Threshold of Nanocrystalline Silicon Film Prepared by Pulsed Laser Ablation

doi:10.3969/j.issn.1000-1565.2009.04.010

Abstract

CLC Number:

O484.1

CHU Li-zhi,DENG Ze-chao,DING Xue-cheng,LU Li-fang,WANG Ying-long. Energy Density Threshold of Nanocrystalline Silicon Film Prepared by Pulsed Laser Ablation[J]. Journal of Hebei University (Natural Science Edition), 2009, 29(4): 372-375.

References

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