Amorphous Si films were prepared by pulsed laser ablation in vacuum at room temperature. These samples were heated by annealing furnace in order to transform into crystalline film. Threshold of nucleation barrier and mean diameter of Si nanoparticle were determined through the results of SEM, Raman and XRD, which were 850 ℃ and 15 nm, respectively. If the shape of nanoparticle is assumed to be ideal sphere, we can obtain the magnitude of threshold nucleation barrier for the nanoparticle through calculation, which is in the order of 10-11 mJ.
DENG Zechao
,
FU Nian
,
CHU Lizhi
,
DING Xuecheng
,
FU Guangsheng
,
WANG Yinglong
. Threshold of nucleation barrier of spherical Si nanoparticle prepared by heat annealing[J]. Journal of Hebei University(Natural Science Edition), 2017
, 37(5)
: 471
-475
.
DOI: 10.3969/j.issn.1000-1565.2017.05.005
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