Journal of Hebei University (Natural Science Edition) ›› 2001, Vol. 21 ›› Issue (1): 34-37.DOI: 10.3969/j.issn.1000-1565.2001.01.008

Previous Articles     Next Articles

Energy Distribution of Electrons and H Atoms on the Surface of the Substrate during Electron Assisted Chemical Vapor Deposition of Diamond

DONG Li-fang,ZHANG Yu-hong,CHEN Jun-ying   

  • Online:2001-02-25 Published:2001-02-25

Abstract: Hydrogen dissociation in the process of electron assisted chemicalvap or deposition(EACVD)of diamond thin films is simulated by using Monte Carlomethod. The model of hydrogen dissociation through electron impacting is suggested . The energy distribution of electrons and H atoms on the surface of the substra te are obtained. The results are of great importance to the study of diamond thi n films deposited by EACVD.

CLC Number: